- Autor
- Pilz, Julian
- Perrotta, Alberto
- Christian, Paul
- Tazreiter, Martin
- Resel, Roland
- Leising, Günther
- TitelTuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
- Datei
- DOI10.1116/1.5003334
- Persistent Identifier
- Erschienen inJournal of vacuum science & technology / A
- Band36
- Erscheinungsjahr2018
- LicenceCC BY
- ISSN0734-2101
- Download Statistik1756
- Peer ReviewJa
- AbstractThe ability to grow inorganic thin films with highly controllable structural and optical properties at low substrate temperature enables the manufacturing of functional devices on thermo-sensitive sub- strates without the need of material postprocessing. In this study, the authors report on the growth of zinc oxide films by direct plasma-enhanced atomic layer deposition at near room temperature. Diethyl zinc and oxygen plasma were used as the precursor and coreactant, respectively. The pro- cess was optimized with respect to the precursor and coreactant dosing as well as to the purging times, which ultimately resulted in saturated atomic layer deposition growth. The so-obtained films exhibit a polycrystalline pattern with a (100) texture and low amount of incorporated carbon. Furthermore, the possibility to tune crystallite size, refractive index, and bandgap of the films by adapting the plasma radio-frequency power is demonstrated.
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